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Nano-CMOS Design for Manufacturability: Robust Circuit and Physical Design for Sub-65nm Technology Nodes

Nano-CMOS Design for Manufacturability: Robust Circuit and Physical Design for Sub-65nm Technology Nodes
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Nano-CMOS Design for Manufacturability: Robust Circuit and Physical Design for Sub-65nm Technology Nodes

 
 
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Description

Discover innovative tools that pave the way from circuit and physical design to fabrication processing

Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions.

This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts:

  • Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance

  • Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability

  • Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM

Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.


Product Details
Author:Ban P. Wong
Hardcover:386 pages
Publisher:Wiley-Interscience
Publication Date:October 20, 2008
Language:English
ISBN:0470112808
Product Length:6.46 inches
Product Width:0.93 inches
Product Height:9.39 inches
Product Weight:1.5 pounds
Package Length:9.21 inches
Package Width:6.22 inches
Package Height:0.94 inches
Package Weight:1.54 pounds
Average Customer Rating: based on 1 reviews

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Average Customer Review:4.0 ( 1 customer reviews )
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4Design for Manufacture @ 40nm and Below  Apr 26, 2010 By Daniel A. Nenni "Daniel Nenni"
Yielding designs at 40nm and below has redefined Design for Manufacture (DFM), the techniques implemented to modify the designs in order to make them more manufacturable, i.e., to improve functional yield, parametric yield, or reliability. Lunch (I blog for food) with my friend BP Wong, co-author of Nano-CMOS Design for Manufacturability, gave me a whole new perspective on DFM.

[...]

Please share your experiences at 40nm and 28nm if possible, be part of the solution to nanometer design.

D.A.N.

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